Hollow cathode sputter ion source for generating high intensity ion beams has electromagnet, externally heated cathode, cooled anti-cathode, cooled anode for Penning plasma

摘要

The device has an electromagnet for generating a rotation symmetrical field, an externally heated cathode with its electrically active region on the magnetic field axis, a cooled anti-cathode or sputter cathode with a hollow chamber with its axis on or parallel to the magnetic field axis with a sputterable wall and an axis-parallel slot-shaped opening and a cooled anode for producing a Penning plasma. Ions are extracted through the opening. The device has an electromagnet for generating a rotation symmetrical field, an externally heated cathode with its electrically active region on the axis of the magnetic field, a cooled anti-cathode or sputter cathode with a hollow chamber with its longitudinal axis on or parallel to the magnetic field axis with a sputterable wall or a wall coated with sputterable material with an axis-parallel slot-shaped opening and a cooled anode for producing a Penning plasma. Ions are extracted from the inner wall material through the opening radially to the hollow chamber axis.