Mixer arrangement, used in production of suspensions for chemical-mechanical polishing of wafers, comprises mixing container connected to one end of liquid pump, and feed and circulating systems

摘要

Mixer arrangement comprises a mixing container (1) partially filled with a liquid; a pump (3) connected to the first inlet (5) and an outlet (6) connected to the mixing container; a feed system (7) connected to the first inlet of the pump for introducing a material (10) to be mixed; and a circulating system (8) connected at one end to the filled part of the mixing container. The pump is a liquid pump (3) with a second inlet (4) which is connected to the other end of the circulating system. Independent claims are included for: (1) An apparatus for the chemical-polishing of wafers comprising the mixer arrangement to form a suspension for the polishing, a polishing device, and a feed between the mixer arrangement and the polishing device; and (2) A process for the production of suspensions for polishing wafers.