| 发明名称 |
Lithography using quantum entangled particles |
| 摘要 |
A system of etching using quantum entangled particles to get shorter interference fringes. An interferometer is used to obtain an interference fringe. N entangled photons are input to the interferometer. This reduces the distance between interference fringes by n, where again n is the number of entangled photons.
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| 申请公布号 |
US2001021487(A1) |
申请公布日期 |
2001.09.13 |
| 申请号 |
US20010819364 |
申请日期 |
2001.03.27 |
| 申请人 |
CALIFORNIA INSTITUTE OF TECHNOLOGY |
发明人 |
WILLIAMS COLIN;DOWLING JONATHAN;ROSSA GIOVANNI DELLA |
| 分类号 |
G03F7/00;G03F7/20;(IPC1-7):G03F7/20 |
主分类号 |
G03F7/00 |
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