| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for modifying the surface of a base material without vacuum treatment and a method for producing an organic thin film. SOLUTION: The method for producing the organic thin film includes an irradiation process in which the base material is irradiated with ultraviolet rays in an atmosphere containing oxygen and a thin film forming process in which the base material is contacted with a compound having one functional group selected from functional groups expressed by formula 1 (wherein, A is an atom selected from Si, Ge, Sn, Ti, and Zr; X is a functional group selected from halogen, alkoxy, and isocyanate), which is bonded to the base material, to form the organic thin film. In this way, a treatment time is curtailed remarkably and production costs can be reduced.
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