发明名称 Bonding pad structure and manufacturing method thereof
摘要 A bonding pad structure and its method of manufacture. The structure has a metallic bonding pad with a patterned surface, a first passivation layer having an opening above the metallic bonding pad and a second passivation layer over the first passivation layer also having an opening above the metallic bonding pad. The method of forming the bonding pad structure includes forming a metallic bonding pad over a substrate, and then forming a first passivation layer over the substrate and the bonding pad. The first passivation layer above the bonding pad is patterned. Using the first passivation layer as a mask, a portion of the exposed metal pad material is removed. A patterned second passivation layer is formed over the first passivation layer. The second passivation layer has an opening that exposes the bonding pad. Finally, residual material from the first passivation layer inside the bonding pad region is removed to expose the bonding pad surface.
申请公布号 US6287950(B1) 申请公布日期 2001.09.11
申请号 US20000535509 申请日期 2000.03.24
申请人 TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. 发明人 WU JYH-REN;LIU CHIA-CHEN
分类号 H01L21/60;H01L23/485;(IPC1-7):H01L21/44 主分类号 H01L21/60
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