Apparatus and method for manufacturing semiconductor device

摘要

A loading area capable of forming a sealed space in co-operation with a reaction chamber is provided. In a state in which the inner space of the reaction chamber is separated from the inner space of the loading area by a shutter plate, the oxygen concentrations in the reaction chamber and the loading area are both adjusted to a specific concentration. After both the oxygen concentrations coincide with each other at the specific value, semiconductor wafers held on a wafer boat are inserted from the loading area into the reaction chamber by a boat lifter.