发明名称 Structures and components thereof having a desired surface characteristic together with methods and apparatuses for producing the same
摘要 Methods and apparatus for plasma modifying a substrate are disclosed along with associated techniques for applying coatings to the substrate. Particular utility has been found using a hollow cathode to generate the plasma along with magnetic focusing means to focus the plasma at the surface of a substrate.
申请公布号 US6287687(B1) 申请公布日期 2001.09.11
申请号 US19990307077 申请日期 1999.05.07
申请人 ASTEN, INC. 发明人 YIALIZIS ANGELO;ELLWANGER RICHARD E.;MIKHAEL MICHAEL G.;DECKER WOLFGANG;JOHNSON C. BARRY;SHIPLEY GALE;O'BRIEN TIMOTHY D.
分类号 D06M10/02;D06M14/26;D06M14/32;(IPC1-7):B32B7/02 主分类号 D06M10/02
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