发明名称 |
Structures and components thereof having a desired surface characteristic together with methods and apparatuses for producing the same |
摘要 |
Methods and apparatus for plasma modifying a substrate are disclosed along with associated techniques for applying coatings to the substrate. Particular utility has been found using a hollow cathode to generate the plasma along with magnetic focusing means to focus the plasma at the surface of a substrate.
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申请公布号 |
US6287687(B1) |
申请公布日期 |
2001.09.11 |
申请号 |
US19990307077 |
申请日期 |
1999.05.07 |
申请人 |
ASTEN, INC. |
发明人 |
YIALIZIS ANGELO;ELLWANGER RICHARD E.;MIKHAEL MICHAEL G.;DECKER WOLFGANG;JOHNSON C. BARRY;SHIPLEY GALE;O'BRIEN TIMOTHY D. |
分类号 |
D06M10/02;D06M14/26;D06M14/32;(IPC1-7):B32B7/02 |
主分类号 |
D06M10/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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