发明名称 Method for programming and reading 2-bit p-channel ETOX-cells with non-connecting HSG islands as floating gate
摘要 A method of reading a 2-bit p-channel memory cell having a p+ drain, a p+ source, a control gate, and a floating gate formed from non-connecting hemispherical silicon grain (HSG) islands. The p+ drain and the p+ source is formed in an n-well. The method comprises: applying a positive voltage to the control gate to generate a gate induced drain leakage (GIDL) current; and measuring a drain GIDL current at the drain and a source GIDL current at the source simultaneously to determine the 2-bit data stored in the memory cell.
申请公布号 US6288943(B1) 申请公布日期 2001.09.11
申请号 US20000614411 申请日期 2000.07.12
申请人 TAIWAN SEMICONDUCTOR MANUFACTURING CORPORATION 发明人 CHI MIN-HWA
分类号 G11C11/56;G11C16/04;H01L21/28;H01L29/423;H01L29/788;(IPC1-7):G11C16/04 主分类号 G11C11/56
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