| 摘要 |
PURPOSE: To provide a method for forming resist patterns capable of reducing the diameter of contact holes. CONSTITUTION: The method for forming the resist patterns for forming a resist 2 on a substrate 1, forming a plurality of holes 3 for formation of the contact holes at prescribed intervals in the prescribed regions of the resist, than causing reflow to deform the holes 3 for forming the contact holes, thereby reducing the diameters of the holes, in which the circumferences of the holes 3 for forming the contact holes are provided with slit patterns 4 which act as the breakwater for the flow of the resist 2, control the deformation quantity of the holes 3 for forming the contact holes and are annihilated in a reflow stage. |
