发明名称 PATTERNING METHODS AND SYSTEMS USING REFLECTED INTERFERENCE PATTERNS
摘要 <p>A method for patterning a layer on a substrate can include projecting coherent radiation toward a reflector surface so that the coherent radiation is reflected off the reflector surface to provide a holographic projection of a desired image wherein the reflector surface includes information that corresponds to an inverse of the holographic projection of the desired image. The substrate including the layer can be maintained in the path of the reflected radiation so that the holographic projection is projected onto the layer. Related systems are also discussed.</p>
申请公布号 WO2001065314(A2) 申请公布日期 2001.09.07
申请号 US2001005593 申请日期 2001.02.22
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