发明名称 |
SEMICONDUCTOR INTEGRATED CIRCUIT APPARATUS AND METHOD OF MANUFACTURING THE SAME |
摘要 |
PURPOSE: To lower the resistance of a gate electrode in a peripheral circuit of a semiconductor integrated circuit apparatus having a nonvolatile memory. CONSTITUTION: The gate electrode GA of MOSQA for a peripheral circuit is constituted by the same gate electrode structure as a nonvolatile memory cell of a two-layer gate electrode structure, and a contact hole SC connecting between conductive films 4 and 6 which constitute the gate electrode GA is arranged in a position where it flatly overlaps an active area LA in the plane of the gate electrode GA.
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申请公布号 |
KR20010085679(A) |
申请公布日期 |
2001.09.07 |
申请号 |
KR20010010113 |
申请日期 |
2001.02.27 |
申请人 |
HITACHI, LTD. |
发明人 |
AKAMATSU SHIRO;KATO MASATAKA;OWADA FUKUO;SATO AKIHIKO;TAKAHASHI MASAHITO |
分类号 |
H01L21/768;G11C7/18;G11C16/04;H01L21/8247;H01L27/10;H01L27/115;H01L29/423;(IPC1-7):H01L27/115 |
主分类号 |
H01L21/768 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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