发明名称 SEMICONDUCTOR INTEGRATED CIRCUIT APPARATUS AND METHOD OF MANUFACTURING THE SAME
摘要 PURPOSE: To lower the resistance of a gate electrode in a peripheral circuit of a semiconductor integrated circuit apparatus having a nonvolatile memory. CONSTITUTION: The gate electrode GA of MOSQA for a peripheral circuit is constituted by the same gate electrode structure as a nonvolatile memory cell of a two-layer gate electrode structure, and a contact hole SC connecting between conductive films 4 and 6 which constitute the gate electrode GA is arranged in a position where it flatly overlaps an active area LA in the plane of the gate electrode GA.
申请公布号 KR20010085679(A) 申请公布日期 2001.09.07
申请号 KR20010010113 申请日期 2001.02.27
申请人 HITACHI, LTD. 发明人 AKAMATSU SHIRO;KATO MASATAKA;OWADA FUKUO;SATO AKIHIKO;TAKAHASHI MASAHITO
分类号 H01L21/768;G11C7/18;G11C16/04;H01L21/8247;H01L27/10;H01L27/115;H01L29/423;(IPC1-7):H01L27/115 主分类号 H01L21/768
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