| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a method of exposure and aligner for exposure by which exposure can be performed efficiently in a short time, and at the same time, the cost of exposure can be reduced, a mask, and a method of manufacturing device. SOLUTION: An aligner E synchronously moves a mask M and a substrate P from an accelerating section H 1 to a decelerating section H 4 through a setting section H 2 and a normal section H 3, and during the movement, transfers the image of a pattern formed on the mask M to the substrate P. When a transfer starting point T is set in the setting section H 2 according to the target accuracy of the pattern to be formed, the exposure can be performed efficiently, in such a way that the exposing area on the substrate P can be expanded, and so on, in the case where the mask M and substrate P are moved by prescribe number of strokes.</p> |
