| 摘要 |
PROBLEM TO BE SOLVED: To easily measure variations in the image formation characteristics, such as a projection magnifying power and position of the focal point of a reduction projection lens under lightning conditions and to optimize the correction coefficient of the image formation characteristics in a short time. SOLUTION: A first process is provided in which the amount of energy exposed that irradiates a projection optical system is controlled in time, and the amount of an image formation characteristics change in the projection optical system is measured with time, when a prescribed pattern formed on a reticle 109 as an original plate is transferred on a wafer 115 as a photosensitive substrate located at a conjugate point of the reticle 109 for exposure, through the intermediary of the reduction projection lens 110 and reduction projection lens aperture stop 111 of a projection optical system. A second process is also provided in which an irradiation variation in the image formation characteristics is turned quantitative. |
