| 摘要 |
PURPOSE: To provide a cleaning method of cleaning the polishing surface of a polishing device and a cleaning device, where a cleaning liquid can be lessened in consumption, and polishing residues can be effectively removed from the polishing surface of a polishing table. CONSTITUTION: A polishing device carries out an polishing operation in such a manner, wherein a work as an object of polishing is pressed against the polishing surface of a polishing table, the work is polished by the relative motion of the polishing surface and the work. and a cleaning liquid is spouted out from an injection nozzle toward the polishing surface of the polishing device to clean the work. The above injection nozzle is composed of mixing injection nozzles 7-1 to 7-4 which spout a mixed fluid, mixing a cleaning liquid and gas together, and the mixed fluid of a cleaning liquid and gas is spouted out from the mixing injection nozzles 7-1 to 7-4 against the polishing surface to clean.
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