| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a fabrication method of an optically transparent substrate on which a semiconductor structure can be built up by epitaxial growth. SOLUTION: This fabrication method of an optically transparent substrate is such that a substrate layer (2) is built up on a substrate (1), which is subjected to lattice-matching, by epitaxial method, an optically transparent layer (3) is bonded to the substrate layer (2) on the side opposite to the substrate (1) by wafer bonding and then the lattice-matched substrate (1) is removed from the bonded unit of the substrate layer (2) and the transparent layer (3).</p> |
