| 摘要 |
PROBLEM TO BE SOLVED: To enable local adjustment for eliminating unevenness in illuminance generated on a photosensitive board to be carried out and to enable adjustment for eliminating unevenness in illuminance to be carried for all exposure conditions to be used. SOLUTION: An adjustment blind 33 is provided near a conjugate point of a mask 23 as an original plate in a lighting optical system to serve as an exposure region shaping means, that locally changes the width of an aperture relating to a first direction as a scanning direction in an exposure region in a second direction vertical with respect to the first direction, the adjustment blind 33 has a function, through which the above exposure region is shaped into an optional shape to eliminate partial unevenness of exposure light volume that irradiates a wafer 25 as a photosensitive substrate, and the maximum aperture width of the adjustment blend 33 related to the first direction amounts to the maximum angle of field of a projection lens 22 related to the first direction.
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