| 摘要 |
<p>PROBLEM TO BE SOLVED: To integrally form at least one projecting arcuate surface on the front surface of an optical material. SOLUTION: At least one projecting arcuate surface 12 analogous to a projecting arcuate surface of a photoresist film is formed on the front surface of the optical material by forming at least one projecting arcuate film 42a by exposure, development on the photoresist film 42 formed on the front surface of the optical material 40 and etching the front surface of the optical material and the photoresist film. As the method for forming the projecting arcuate surface 12 by the photolithography method, exposure intensity is changed gradually from the center of a pattern of a circular or elliptic pattern toward the periphery in an exposure stage for exposing the pattern described above on the photoresist film.</p> |
