| 摘要 |
PROBLEM TO BE SOLVED: To improve the accuracy of a pattern by making the thickness of an applied resist in the thin film region of a membrane mask blank highly uniform. SOLUTION: The membrane mask blank 101, composed of a Ta film which is formed as a light-shielding body, an SiN thin film which is formed as a membrane, a support substrate which supports the peripheral edge section of the membrane, and a reinforcing frame which reinforces the support substrate is placed on a rotating head section 301 of a spin coater. While the rear surface side of the reinforcing frame is stuck to the head section 301 by vacuum, the resist is applied to one main surface of the blank 101 by dropping the resist from a nozzle 303 onto the central part of the blank 101, while the head section 301 is rotating. The height position of the membrane is detected by means of a measuring sensor 308 from the side opposite to the surface applied with the resist, by impressing a gas pressure upon the membrane from the side opposite to the surface applied with the resist, and the gas pressure is controlled so that the detected height position falls within a desired range. |
