PROCESS SIMULATOR FOR PHOTOSENSITIVE POLYIMIDE, METHOD FOR PRODUCING POLYIMIDE PATTERN AND RECORDING MEDIUM

摘要

PROBLEM TO BE SOLVED: To provide a simulator capable of simulating the shape of a photosensitive polyimide film difficult to simulate so far owing to too many factors by short-time calculation on a personal computer with a satisfied user interface and a recording medium. SOLUTION: In the process simulator for a photosensitive polyimide which forecasts the pattern shape of a polyimide film 2 formed using a polyimide precursor dissolved in a solvent and a photosensitive agent, the pattern shape is forecasted by calculation in consideration of one or more factors in the photosensitive agent used and processing of prebaking, exposure, post-exposure baking and development.