METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

摘要

PROBLEM TO BE SOLVED: To provide a method of manufacturing a flat panel display having high functions. SOLUTION: A system comprising an active matrix-type display mounted with a CPU and memories is formed of thin-film transistors. A crystalline silicon film used for the thin-film transistors is crystallized through a manner, in which amorphous silicon in which an element such as nickel that promotes the crystallization of amorphous silicon is introduced is crystallized through a thermal treatment carried out at temperatures of 450 deg.C to 650 deg.C, and a thermal treatment of higher temperature (RTA) is carried out to improve crystalline silicon film in crystallinity.