ION SOURCE AND ITS OPERATING METHOD

摘要

PURPOSE: To enhance the rate of the molecular ion extracted from the ion source in the ion beam. CONSTITUTION: The ion source is designed to satisfy the relation L < 3.37 B-1 radic(VA)x10-6 where the arc voltage impressed between the plasma-generating receptacle 2 and the filament 8 is VA £V|, the magnetic flux density of the magnetic field 19 inside the plasma-generating receptacle 2 is B £T| and where the least smallest distance from the most abundant electron-emitting point 9 around the center of the heat of the filament 8 to the wall face of plasma generating receptacle 2 is set to L £m|.