| 摘要 |
PURPOSE: An exposure apparatus is provided to enable the production of a high accuracy, high quality photomask or micro device and enable the reliable detection of whether a substrate has been loaded onto a holder. CONSTITUTION: The ultraviolet pulse light IL of the light from a light source(100) passes through a beam matching unit(101) including movable mirrors etc. for matching of the position of the optical path with the illumination optical system(1) and enters a variable light attenuator(103) serving as a light attenuator through a pipe(102). A main control system(9) controls the amount of exposure of the resist on the substrate(4) by communicating with the light source(100). The main control system(9) controls start and stop emission of light, the oscillation wavelength, and the output as determined by the pulse energy and adjusts the light attenuation rate of the variable light attenuator(103) with respect to the exposure light IL in stages or continuously. |
