发明名称 EXCIMER LASER SYSTEM
摘要 PROBLEM TO BE SOLVED: To provide an excimer laser system that can control generation of impurity gas with fluorine gas and also control rise of gas temperature. SOLUTION: In the excimer laser system using the fluorine gas as the laser medium, aluminum nitride is used as an insulator for mounting a discharging electrode for laser oscillation or as the main material to form a laser gas vessel.
申请公布号 JP2001244523(A) 申请公布日期 2001.09.07
申请号 JP20000051272 申请日期 2000.02.28
申请人 NIDEK CO LTD 发明人 HAYASHI TOSHIHARU;KOJIMA KAZUNOBU;ADACHI MUNEYUKI
分类号 H01S3/03;H01S3/041;H01S3/225;(IPC1-7):H01S3/03 主分类号 H01S3/03
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