发明名称 REFLECTION/REFRACTION OPTICAL SYSTEM AND PROJECTION EXPOSURE APPARATUS COMPRISING THE OPTICAL SYSTEM
摘要 A reflection/refraction optical system such that the optical adjustment and machine design are easy, the aberrations such as the color aberration are well corrected, and a high resolution of, e.g., 0.1 mu m is achieved. The optical system comprises a first image-forming optical system (G1) for forming a first intermediate image on a first plane (R), a first optical-path folding mirror (1) disposed near the first intermediate image, a second image-forming optical system (G2) having a concave reflecting mirror (CM) and at least one negative lens (3) and adapted for forming a second intermediate image, a second optical-path folding mirror (2) disposed near the second intermediate image, and a third image-forming optical system (G3) for forming a reduced image of the image on the first plane on a second plane (W). The reflecting surface of the first optical-path folding mirror does not overlap spatially with the reflecting surface of the second optical-path reflecting mirror.
申请公布号 WO0165296(A1) 申请公布日期 2001.09.07
申请号 WO2001JP01350 申请日期 2001.02.22
申请人 NIKON CORPORATION 发明人 OMURA, YASUHIRO;SHIRAISHI, NAOMASA;OWA, SOICHI
分类号 G02B13/24;G02B17/08;G03F7/20;(IPC1-7):G02B17/08 主分类号 G02B13/24
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