| 摘要 |
PURPOSE: Provided are a phenol novolak resin forming excellent fine overcrowded or isolated pattern, and excellent in sensitivity, resolution and focal depth-width property, and a positive-type photoresist composition. CONSTITUTION: The phenol novolak resin is characterized in that: strength ratios of o-o/o-p/p-p peaks determined by 13C-NMR measurement are 5.0-8.5/2.5-4.5/1, respectively, and the resin has a phenolic constituting unit represented by the following formulae (1) to (4) and a molecular weight of 3,000-20,000.
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