发明名称 SUBSTRATE-TREATING DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a treating device of substrates, which can select a plurality of or one treatment that are carried out to the substrates for efficiently and reliably performing the treatment. SOLUTION: Around a delivery mechanism 1 of the substrate, several units are arranged while the substrate can be delivered by the delivery mechanism. More specifically, an optical treatment unit 6 applies light of specific wavelength onto the substrate for removing organic matters; a spin treatment unit 7 performs washing treatment with washing liquid while the substrate is being rotated, and dried the substrate that is subjected to washing treatment; a drying treatment unit 8 allows the substrate to be subjected to drying treatment with volatile liquid when the state of the substrate that is dried by the spin treatment unit is insufficient; and an accommodation unit has a loader part 11 for housing untreated substrates and an unloader part 12 for housing treated ones, takes out the untreated substrates from the loader with the delivery mechanism, and house the treated substrates into the unloader part.
申请公布号 JP2001244229(A) 申请公布日期 2001.09.07
申请号 JP20000051684 申请日期 2000.02.28
申请人 SHIBAURA MECHATRONICS CORP 发明人 NISHIBE YUKINOBU;ISO AKINORI;HARA AKIRA;TOYOSHIMA NORIO
分类号 H01L21/027;H01L21/304;(IPC1-7):H01L21/304 主分类号 H01L21/027
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