| 摘要 |
PROBLEM TO BE SOLVED: To provide a pretreatment device for analyzing the surface impurity of a plate specimen, having superior determination accuracy and detection sensitivity of the impurity. SOLUTION: A lower case 20 is provided with a recess 22 to have a clearance formed toward a semiconductor substrate 10. The recess 22 is provided with two opening holes, a tightly closable injection hole 23 and air vent hole 24 so that, while releasing air from the air vent hole 24, the treatment liquid 50 is injected from the injection hole 23 and brought in contact with a treatment surface of the semiconductor substrate 10.
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