| 摘要 |
PROBLEM TO BE SOLVED: To provide a ferroelectrics memory cell and an FeRAM element using the same which can improve further its integration density by the structure of its bit-line separated from its active region and has its bit-line structure comprising a depletion type transistor. SOLUTION: The ferroelectrics memory cell used for an FeRAM element includes a first active region 10 including the gate of a depletion type transistor, a second active region 20 including the gate of an enhancement type transistor and abutting on the first active region 10, a word line 66 connected with the gates of the depletion type and enhancement type transistors, and a ferroelectrics capacitor for storing data therein and connected with the drain of the enhancement type transistor.
|
