发明名称 SURVO CONTROL METHOD AND DEVICE FOR HIGH-EMITTANCE ELECTRON SOURCE
摘要 PROBLEM TO BE SOLVED: To enable to provide electron beam stably for a long time, preventing change in its emission due to wear or the like of an element member. SOLUTION: A stable emission of electron beam with time is required for an electron source to be used for an electron beam semiconductor photolithography device. Therefore, emission current is detected, and heating power source for the electron source is controlled so that the output value of the emission current is within a prescribed value.
申请公布号 JP2001243903(A) 申请公布日期 2001.09.07
申请号 JP20010016995 申请日期 2001.01.25
申请人 NIKON CORP 发明人 SAMUEL K DOORAN;GOLLADAY STEVEN D
分类号 G03F7/20;H01J1/13;H01J37/04;H01J37/06;H01J37/24;H01L21/027;(IPC1-7):H01J37/04 主分类号 G03F7/20
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