| 发明名称 |
METHOD AND APPARATUS FOR PERFORMING HIGHLY IONIZED, LOW ENERGY PHYSICAL VAPOR DEPOSITION |
| 摘要 |
A method and apparatus for performing highly ionized and low energy physical vapor deposition (PVD). The pressure is selected to increase the ionization of atoms sputtered from a target and de-energize these ions. The highly ionized, low energy target atoms are more easily attracted to a substrate that is biased.
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| 申请公布号 |
WO0165588(A2) |
申请公布日期 |
2001.09.07 |
| 申请号 |
WO2001US06954 |
申请日期 |
2001.03.02 |
| 申请人 |
APPLIED MATERIALS, INC. |
发明人 |
FU, JIANMING |
| 分类号 |
H01J37/34;(IPC1-7):H01J37/32 |
主分类号 |
H01J37/34 |
| 代理机构 |
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