SEMICONDUCTOR MANUFACTURING APPARATUS

摘要

PROBLEM TO BE SOLVED: To provide a semiconductor manufacturing apparatus in which a space used to process a semiconductor such as a wafer or the like is always maintained in a state that impurities are not mixed and in a good vacuum state and which can manufacture a high-quality semiconductor. SOLUTION: The semiconductor manufacturing apparatus 1 is provided with at least a vacuum treatment chamber. The chamber comprises a soaking plate 3 on which the semiconductor 2 is placed so as to heat the semiconductor 2 uniformly. The chamber comprises a heater 4 which heats the plate 3. The chamber comprises a heat insulating plate 5 which covers the heater 4 and which is connected to the plate 3. The chamber comprises a cover member (not indicated in the Fig.) which is connected airtighly to the plate 5 so as to form a treatment space. The chamber comprises a vacuum pump (not indicated in the Fig.) which sucks the air inside the treatment space and by which a vacuum state is set. A non-foamed material 6 and a heat-resistant adhesive 7 are arranged so as to surround the connection part of the plate 3 to the plate 5.