发明名称 SEMICONDUCTOR ELEMENT AND MANUFACTURING METHOD THEREFOR
摘要 PROBLEM TO BE SOLVED: To easily obtain satisfactory interface in SrTiO3 whose concentration of a carrier is comparatively high and which is made into semiconductor, and to realize a semiconductor element superior in Schottky connection and interface control by an oxide semiconductor. SOLUTION: An oxide semiconductor is annealed in oxygen at 1000 deg.C and it is cleaned by using acid in a nitrogen atmosphere. Thus, a substance causing an interface level is removed and an electrically clean surface is obtained.
申请公布号 JP2001244482(A) 申请公布日期 2001.09.07
申请号 JP20000081003 申请日期 2000.03.22
申请人 SANYO ELECTRIC CO LTD 发明人 INOUE SATOSHI
分类号 H01L29/872;H01L21/304;H01L21/308;H01L21/8242;H01L27/10;H01L27/108;H01L29/47 主分类号 H01L29/872
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