X-RAY EXPOSURE APPARATUS, X-RAY EXPOSING METHOD, X-RAY MASK, X-RAY MIRROR, SYNCHROTRON RADIATOR, SYNCHROTRON RADIATING METHOD, AND SEMICONDUCTOR DEVICE,申请号KR1020017001083-传众专利搜索

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发明名称	X-RAY EXPOSURE APPARATUS, X-RAY EXPOSING METHOD, X-RAY MASK, X-RAY MIRROR, SYNCHROTRON RADIATOR, SYNCHROTRON RADIATING METHOD, AND SEMICONDUCTOR DEVICE
摘要
申请公布号	KR20010085303(A)	申请公布日期	2001.09.07
申请号	KR1020017001083	申请日期	2001.01.26
申请人		发明人
分类号	H01L21/027	主分类号	H01L21/027
代理机构		代理人
主权项
地址

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