| 摘要 |
There is described a reactor for manufacturing a semiconductor device. The reactor includes a container for enclosing a gas and has an aperture and a surface ambient to the aperture. A seal for sealing the aperture of the container with a surface is pressed against the surface of the container. Portions of the surface of the container and corresponding portions of the surface of the seal form a combination of a beveled peak and groove surrounding the aperture. Therefore, with improved sealing a pressure variation of the gas within the container caused by a pressure variation in the ambient environment is reduced.
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