发明名称 Semiconductor integrated circuit device
摘要 To reduce cost of defect redundancy and trimming in a semiconductor integrated circuit having multiple layer wirings and copper wirings, address for salvaging defect of a memory cell array in a semiconductor is stored by using a nonvolatile memory element constituting a floating electrode by a first layer of polysilicon, or the nonvolatile memory element is programmed in testing the semiconductor integrated circuit, thereby, a special process is not needed in forming the nonvolatile memory element, that is, the nonvolatile memory element can be formed in a process of forming CMOS device and apparatus of laser beam for programming is not needed since the programming is carried out in testing, time necessary for programming can be shortened and therefore, testing cost can be reduced.
申请公布号 US2001019499(A1) 申请公布日期 2001.09.06
申请号 US20010780393 申请日期 2001.02.12
申请人 ISHIBASHI KOICHIRO;SHUKURI SHOJI;YANAGISAWA KAZUMASA;NISHIMOTO JUNICHI;YAMAOKA MASANAO;AOKI MASAKAZU 发明人 ISHIBASHI KOICHIRO;SHUKURI SHOJI;YANAGISAWA KAZUMASA;NISHIMOTO JUNICHI;YAMAOKA MASANAO;AOKI MASAKAZU
分类号 H01L21/8247;G11C16/04;G11C29/00;G11C29/04;G11C29/12;G11C29/42;H01L21/66;H01L23/532;H01L23/544;H01L27/02;H01L27/105;H01L27/108;H01L29/788;H01L29/792;(IPC1-7):G11C11/34;G11C16/06;G11C7/00 主分类号 H01L21/8247
代理机构 代理人
主权项
地址