| 摘要 |
System comprises a substrate as carrier with a coating having a hardness of at least 850 HV. Preferred Features: The coating is made from titanium, nitrogen, phosphorus, aluminum, silicon, germanium, iron, nickel, tungsten, chromium and/or zirconium. The layer has a thickness of 1 nm - 50 mu m and is applied by PVD, PECVD or CVD.
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