| 摘要 |
Component comprises a substrate, an intermediate layer and an amorphous carbon foil. The intermediate layer is made from a group IVa, Va, VIa, IIIb or IVb element with the exception of carbon, or a carbide of these. The intermediate layer has a thickness of 0.5-10 nm. Preferred Features: A ceramic layer is formed between the substrate and the intermediate layer. The ceramic layer is made from TiAlN, ZrN or VN with a thickness of 0.2-5 mu m. The intermediate layer is made from Ti, Zr, Hf, V, Nb, Ta, Cr, Mo, W, Si or a carbide of these. The substrate is made from a ceramic, iron-based alloy, aluminum alloy, sintered material based on iron, sintered carbides, diamond sintered material or cubic boron carbide sintered material. The carbon foil is applied by sputtering or vacuum arc deposition. |
