发明名称 |
Semiconductor arrangement used in a solar cell comprises a polycrystalline silicon layer formed by heat treating an amorphous silicon layer in the presence of a metallic catalyst |
摘要 |
Semiconductor arrangement comprises a polycrystalline silicon layer (160) formed by heat treating an amorphous silicon layer (60) in the presence of a metallic catalyst (40) which is distributed point-like in the upper or lower region of the amorphous silicon layer. An Independent claim is also included for a process for the production of a semiconductor arrangement. Preferred Features: The polycrystalline silicon layer has no single crystal silicon layers whose electrical conducting types differ on both sides. The polycrystalline silicon layer is formed from intrinsic polycrystalline silicon.
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申请公布号 |
DE10105986(A1) |
申请公布日期 |
2001.09.06 |
申请号 |
DE2001105986 |
申请日期 |
2001.02.09 |
申请人 |
HITACHI CABLE, LTD. |
发明人 |
MURAMATSU, SHINICHI;MINAGAWA, YASUSHI;OKA, FUMIHITO;TAKAHASHI, SUSUMU;YAZAWA, YOSHIAKI |
分类号 |
C30B11/00;C30B11/12;C30B25/02;H01L21/20;H01L31/0368;H01L31/18;(IPC1-7):C30B29/06;H01L21/205 |
主分类号 |
C30B11/00 |
代理机构 |
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主权项 |
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