发明名称 Semiconductor arrangement used in a solar cell comprises a polycrystalline silicon layer formed by heat treating an amorphous silicon layer in the presence of a metallic catalyst
摘要 Semiconductor arrangement comprises a polycrystalline silicon layer (160) formed by heat treating an amorphous silicon layer (60) in the presence of a metallic catalyst (40) which is distributed point-like in the upper or lower region of the amorphous silicon layer. An Independent claim is also included for a process for the production of a semiconductor arrangement. Preferred Features: The polycrystalline silicon layer has no single crystal silicon layers whose electrical conducting types differ on both sides. The polycrystalline silicon layer is formed from intrinsic polycrystalline silicon.
申请公布号 DE10105986(A1) 申请公布日期 2001.09.06
申请号 DE2001105986 申请日期 2001.02.09
申请人 HITACHI CABLE, LTD. 发明人 MURAMATSU, SHINICHI;MINAGAWA, YASUSHI;OKA, FUMIHITO;TAKAHASHI, SUSUMU;YAZAWA, YOSHIAKI
分类号 C30B11/00;C30B11/12;C30B25/02;H01L21/20;H01L31/0368;H01L31/18;(IPC1-7):C30B29/06;H01L21/205 主分类号 C30B11/00
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