发明名称 Designer particles of micron and submicron dimension
摘要 Micron-sized particles are produced in quantity by one of various methods, including generally the steps of preparing a substrate surface through a lithographic process, the surface being characterized by defining a plurality of elements, depositing a layer of particle material on the substrate surface including the elements, processing the substrate surface to isolate the material deposited on the elements, and separating the particles from the elements. The size and shape of the elements predetermine the size and shape of the particles. The elements may comprise, inter alia, pillars of photoresist or spaces on the substrate surrounded and defined by photoresist.
申请公布号 US6284345(B1) 申请公布日期 2001.09.04
申请号 US19970980980 申请日期 1997.12.08
申请人 WASHINGTON UNIVERSITY 发明人 RUOFF RODNEY S.
分类号 B81B1/00;B81C1/00;C23C14/00;C23C14/04;G03F7/00;(IPC1-7):B32B3/22;B32B5/02;B28B5/00 主分类号 B81B1/00
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