发明名称 |
PACKED HIGH PURITY TARGET |
摘要 |
PROBLEM TO BE SOLVED: To provide a packed high purity target in which neither stability nor long service life when starting the use in sputtering is degraded even when the target is stored and carried in a packed condition and taken out of the pack and used in sputtering. SOLUTION: The high purity target is packed by using a film having a surface on which no releasable particles of not less than 2.0μm are present on at least one side of the film with a face side thereof on the high purity target side.
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申请公布号 |
JP2001240959(A) |
申请公布日期 |
2001.09.04 |
申请号 |
JP20000302268 |
申请日期 |
2000.10.02 |
申请人 |
MITSUI MINING & SMELTING CO LTD |
发明人 |
WATANABE HIROSHI;TAKAHASHI SEIICHIRO |
分类号 |
B65D77/00;C23C14/08;C23C14/34;(IPC1-7):C23C14/34 |
主分类号 |
B65D77/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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