发明名称 PACKED HIGH PURITY TARGET
摘要 PROBLEM TO BE SOLVED: To provide a packed high purity target in which neither stability nor long service life when starting the use in sputtering is degraded even when the target is stored and carried in a packed condition and taken out of the pack and used in sputtering. SOLUTION: The high purity target is packed by using a film having a surface on which no releasable particles of not less than 2.0μm are present on at least one side of the film with a face side thereof on the high purity target side.
申请公布号 JP2001240959(A) 申请公布日期 2001.09.04
申请号 JP20000302268 申请日期 2000.10.02
申请人 MITSUI MINING & SMELTING CO LTD 发明人 WATANABE HIROSHI;TAKAHASHI SEIICHIRO
分类号 B65D77/00;C23C14/08;C23C14/34;(IPC1-7):C23C14/34 主分类号 B65D77/00
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