发明名称 |
TREATMENT METHOD AND TREATING LIQUID FOR SOLID SURFACE AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE USING THE SAME |
摘要 |
PROBLEM TO BE SOLVED: To etch and melt noble metals represented by ruthenium, within a practicably usable time range. SOLUTION: An oxidizing agent having a sufficiently higher oxidation reduction potential as compared to the metal to be treated is used and the reaction with the oxygen atoms released from this oxidizing agent is utilized in the process of reaction.
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申请公布号 |
JP2001240985(A) |
申请公布日期 |
2001.09.04 |
申请号 |
JP20000101197 |
申请日期 |
2000.03.31 |
申请人 |
HITACHI LTD;HITACHI ULSI SYSTEMS CO LTD |
发明人 |
SAEKI TOMONORI;KASHI MIEKO;FUTASE TAKUYA |
分类号 |
B08B3/08;C23F1/14;H01L21/304;H01L21/308;(IPC1-7):C23F1/14 |
主分类号 |
B08B3/08 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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