| 摘要 |
PURPOSE:To accurately measure a gap between a pattern mask and a glass substrate nearly over the whole face in a substrate aligner. CONSTITUTION:A plurality of holes 14, for measurement use, through which a measuring shaft part 13 at a dial gauge 12 is passed are made at prescribed intervals so as to be scattered nearly over the whole surface of the sheet face of a sheet material whose size and material are the same as those of a pattern mask on which an interconnection pattern has been formed. A perforated mask 10 is used in the following manner: it is supported by a mask chuck 2 instead of the pattern mask; it is set in such a way that the measuring shaft part 13 at the dial gauge 12 is passed through the holes 14 for measurement use; and a gap between the mask and the surface of a glass substrate 3 supported by a substrate chuck 4 situated at the lower part is measured directly. |
