发明名称 Positioning system and position measuring method for use in exposure apparatus
摘要 A positioning system includes a movable member being movable along a reference plane containing first and second directions, and a position measuring device for measuring positional information related to the movable member, wherein the movable member includes an element having a reflection surface inclined with respect to the reference plane, and wherein the position measuring device includes a measuring system for causing a measurement beam to be reflected by the inclined reflection surface and for detecting positional information related to the movable member with respect to a direction intersecting the reference plane.
申请公布号 US6285444(B1) 申请公布日期 2001.09.04
申请号 US19990314170 申请日期 1999.05.19
申请人 CANON KABUSHIKI KAISHA 发明人 OSANAI EIJI;AKUTSU KOTARO
分类号 H01L21/027;G01B11/00;G03F7/20;(IPC1-7):G03B27/42;G03B27/58 主分类号 H01L21/027
代理机构 代理人
主权项
地址