发明名称 Continuous gas saturation system and method
摘要 Provided is a system for controlled vaporization of a liquid chemical. The system includes: (a) an evaporation vessel connected to receive a liquid chemical which is carrier gas free; (b) a mechanism for maintaining the liquid chemical in the evaporation vessel at a substantially constant level; and (c) a mechanism for controlling the temperature of the liquid chemical in the evaporation vessel to a desired value, the controlling mechanism including: (I) a system for cooling the liquid chemical, and (II) a heater inside the evaporation vessel for heating the liquid chemical. Also provided, are methods of controlled delivery of a vaporized liquid chemical. The above systems and methods are particularly applicable to the semiconductor manufacturing industry.
申请公布号 US6283066(B1) 申请公布日期 2001.09.04
申请号 US20000570940 申请日期 2000.05.15
申请人 AIR LIQUIDE AMERICA CORPORATION 发明人 NURMI DOUGLAS B.
分类号 H01L21/223;C23C16/44;C23C16/448;H01L21/205;H01L21/265;H01L21/31;(IPC1-7):F22B1/00 主分类号 H01L21/223
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