| 摘要 |
An exposure apparatus for correcting an illuminance non-uniformity taking place when illumination conditions are changed. The exposure apparatus includes an illumination optical system for illuminating a reticle having a pattern, a projection optical system for projecting the pattern onto a substrate, a lens member and a drive mechanism for changing an illuminance distribution on a surface to be illuminated, symmetrically with respect to an optical axis, and an optical filter and a drive mechanism for changing the illuminance distribution on the surface to be illuminated, asymmetrically with respect to the optical axis. The exposure apparatus separates the illuminance distribution on the surface to be illuminated into a component symmetrical with respect to the optical axis and a component asymmetrical with respect to the optical axis. (i) The lens member and the drive mechanism and (ii) the optical filter and the drive mechanism independently change the respective components.
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