| 发明名称 |
Ester compounds, polymers, resist compositions and patterning process |
| 摘要 |
A novel ester compound having an exo-form 2-alkylbicyclo[2.2.1]heptan-2-yl group as the protective group is provided as well as a polymer comprising units of the ester compound. The polymer is used as a base resin to formulate a resist composition having a higher sensitivity, resolution and etching resistance than conventional resist compositions.
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| 申请公布号 |
US6284429(B1) |
申请公布日期 |
2001.09.04 |
| 申请号 |
US20000512108 |
申请日期 |
2000.02.24 |
| 申请人 |
SHIN-ETSU CHEMICAL CO., LTD. |
发明人 |
KINSHO TAKESHI;NISHI TSUNEHIRO;KURIHARA HIDESHI;NAKASHIMA MUTSUO;HASEGAWA KOJI;WATANABE TAKERU |
| 分类号 |
C07C69/00;C07C69/753;C08F32/08;C08F34/00;C08F220/00;C08G61/08;C08L65/00;C09D167/00;G03F7/004;G03F7/027;G03F7/039;(IPC1-7):G03F7/004;C08F10/00;C07C67/74 |
主分类号 |
C07C69/00 |
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