发明名称 METHOD FOR APPLYING RADIO FREQUENCY POWER IN CLEANING PROCESS OF EVAPORATION EQUIPMENT
摘要 PURPOSE: A method for applying radio frequency power in a cleaning process of evaporation equipment is provided to reduce process errors and to improve manufacturing yield, by securely performing a cleaning process. CONSTITUTION: Radio frequency power is applied to a pedestal part in an upper portion of an electrostatic chuck which electronically performs a chucking in a cleaning process, so that a difference of an etch rate is minimized in the cleaning process. The pedestal part is installed in an upper portion of a quartz insulator placed on the chuck.
申请公布号 KR20010083608(A) 申请公布日期 2001.09.01
申请号 KR20000007482 申请日期 2000.02.17
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 KIM, JEONG TAE;MUN, GONG JU
分类号 H01L21/20;(IPC1-7):H01L21/20 主分类号 H01L21/20
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