发明名称 |
METHOD FOR APPLYING RADIO FREQUENCY POWER IN CLEANING PROCESS OF EVAPORATION EQUIPMENT |
摘要 |
PURPOSE: A method for applying radio frequency power in a cleaning process of evaporation equipment is provided to reduce process errors and to improve manufacturing yield, by securely performing a cleaning process. CONSTITUTION: Radio frequency power is applied to a pedestal part in an upper portion of an electrostatic chuck which electronically performs a chucking in a cleaning process, so that a difference of an etch rate is minimized in the cleaning process. The pedestal part is installed in an upper portion of a quartz insulator placed on the chuck.
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申请公布号 |
KR20010083608(A) |
申请公布日期 |
2001.09.01 |
申请号 |
KR20000007482 |
申请日期 |
2000.02.17 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
KIM, JEONG TAE;MUN, GONG JU |
分类号 |
H01L21/20;(IPC1-7):H01L21/20 |
主分类号 |
H01L21/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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