| 摘要 |
<p>PROBLEM TO BE SOLVED: To detect and extract a failure portion of an aligner while production continues, and to calculate a proper offset value in which an adjusting variation within a lot is reflected without increasing an adjusting check frequency. SOLUTION: Information of an aligner, a mask and a wafer, information of a processing step before the exposure and measuring result for the aligner are given as independent variables, an adjusting measured value after the exposure is given as a dependent variable, a combination relation for all those variables are evaluated by F calibration quantitatively and diagnostic information for failures is given. Additionally, an offset value is calculated by a primary approximate formula for a relation variable extracted by the above and is fed back to the exposure device.</p> |
