| 摘要 |
PROBLEM TO BE SOLVED: To specially provide an optical device having a slot type image field or a non-rotationally symmetrical illumination, specially a microlithography projection printed device. SOLUTION: An optical device has a slot type image field or a non- rotationally symmetrical illumination. Accordingly, an optical element 5 is exerted the action of a non-rotationally symmetrical form by radioactive rays from a light source. Gas feeding units 19 or a gas feeding unit 23 are or is used for adjusting the element 5. This feeding unit is provided with at least one feeding line 21 and these feeding units are respectively provided with at least one gas pouring unit 11. These gas pouring units 11 are arranged to the element 5 and the element 5 can be controlled by a method, where gas is poured on the element 5 by the units 11 facing the element 5. Accordingly, the flow rate of the volume of the gas to appear has a volume and distributions 17 in the area, which comport with the intensity disdistribution 6 of the radioactive rays. By adjusting the element 5 in such a way, a defective image formation, which is induced in the element 5, is avoided or compensated with non- rotationally symmetrical light.
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