发明名称 SUBSTRATE HAVING CARBON FILM AND FILM ESSENTIALLY CONSISTING OF CARBON
摘要 PROBLEM TO BE SOLVED: To provide a technique, in the case an inorganic protective film is deposited on a member having a surface consisting of an organic matter such as plastics and an iron plate coated with a coating material by using a plasma CVD method, for improving the adhesive properties between the inorganic protective film and the organic matter on the surface of the member. SOLUTION: A carbon film and a film with an amorphous structure or a crystal structure essentially consisting of carbon into which fluorine and hydrogen have been added and having translucency to visible light and being in contact with the carbon film can be deposited. Moreover, in the initial stage of the film deposition, the surface of a substrate is heated by plasma for a short time to partially melt the surface part, so that the adhesion of the films can be improved.
申请公布号 JP2001234342(A) 申请公布日期 2001.08.31
申请号 JP20010011090 申请日期 2001.01.19
申请人 SEMICONDUCTOR ENERGY LAB CO LTD 发明人 YAMAZAKI SHUNPEI;HAYASHI SHIGENORI
分类号 C23C16/27;C08J7/00;C08J7/04;C23C16/509;C30B29/04;(IPC1-7):C23C16/27 主分类号 C23C16/27
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